Photo-assisted molecular beam epitaxy of ZnSe on GaAs substrates with UV irradiation is reported. The growth rate is observed to be a function of the layer thickness and at high UV levels growth can be totally supressed. Photo-assisted doping has been investigated for the first time in ZnSe and changes of up to 20x in the doping level are reported for iodine, n-type doped material. The results are discussed in terms of hole accumulation at the surface affecting the incorporation of selenium and iodine. © 1992.
|Number of pages||5|
|Journal||Journal of Crystal Growth|
|Publication status||Published - 2 Feb 1992|