Unusual morphology of CVD diamond surfaces after RIE

Maria D Stoiku, Phillip John, J. I B Wilson

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)


Reactive ion etching of (100) CVD diamond films in O2 has been performed using a 13.56 MHz capacitively coupled reactor at pressures of 20 mTorr-100 mTorr and r.f. powers of 100 W-300 W. The formation of columnar structures was observed at the grain boundaries whereas the (100) facets were etched to yield a smooth surface under optimum conditions. For comparison, the RIE of single, isolated cubo-octahedral crystallites produced smooth (100) facets and roughened (111) surfaces reminiscent of the micro-columnar structures evident in the films. © 2008 Elsevier B.V. All rights reserved.

Original languageEnglish
Pages (from-to)1164-1168
Number of pages5
JournalDiamond and Related Materials
Issue number7-10
Publication statusPublished - Jul 2008


  • Chemical vapor deposition
  • Diamond film
  • Microstructure
  • Plasma CVD
  • Reactive ion etching (RIE)


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