Unusual morphology of CVD diamond surfaces after RIE

Maria D Stoiku; Phillip John; J. I B Wilson

doi:10.1016/j.diamond.2008.03.018

Unusual morphology of CVD diamond surfaces after RIE

Maria D Stoiku, Phillip John, J. I B Wilson

School of Engineering & Physical Sciences

Research output: Contribution to journal › Article › peer-review

27 Citations (Scopus)

Abstract

Reactive ion etching of (100) CVD diamond films in O₂ has been performed using a 13.56 MHz capacitively coupled reactor at pressures of 20 mTorr-100 mTorr and r.f. powers of 100 W-300 W. The formation of columnar structures was observed at the grain boundaries whereas the (100) facets were etched to yield a smooth surface under optimum conditions. For comparison, the RIE of single, isolated cubo-octahedral crystallites produced smooth (100) facets and roughened (111) surfaces reminiscent of the micro-columnar structures evident in the films. © 2008 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	1164-1168
Number of pages	5
Journal	Diamond and Related Materials
Volume	17
Issue number	7-10
DOIs	https://doi.org/10.1016/j.diamond.2008.03.018
Publication status	Published - Jul 2008

Keywords

Chemical vapor deposition
Diamond film
Microstructure
Plasma CVD
Reactive ion etching (RIE)

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abstract = "Reactive ion etching of (100) CVD diamond films in O2 has been performed using a 13.56 MHz capacitively coupled reactor at pressures of 20 mTorr-100 mTorr and r.f. powers of 100 W-300 W. The formation of columnar structures was observed at the grain boundaries whereas the (100) facets were etched to yield a smooth surface under optimum conditions. For comparison, the RIE of single, isolated cubo-octahedral crystallites produced smooth (100) facets and roughened (111) surfaces reminiscent of the micro-columnar structures evident in the films. {\textcopyright} 2008 Elsevier B.V. All rights reserved.",

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author = "Stoiku, {Maria D} and Phillip John and Wilson, {J. I B}",

year = "2008",

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AU - John, Phillip

AU - Wilson, J. I B

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AB - Reactive ion etching of (100) CVD diamond films in O2 has been performed using a 13.56 MHz capacitively coupled reactor at pressures of 20 mTorr-100 mTorr and r.f. powers of 100 W-300 W. The formation of columnar structures was observed at the grain boundaries whereas the (100) facets were etched to yield a smooth surface under optimum conditions. For comparison, the RIE of single, isolated cubo-octahedral crystallites produced smooth (100) facets and roughened (111) surfaces reminiscent of the micro-columnar structures evident in the films. © 2008 Elsevier B.V. All rights reserved.

KW - Chemical vapor deposition

KW - Diamond film

KW - Microstructure

KW - Plasma CVD

KW - Reactive ion etching (RIE)

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DO - 10.1016/j.diamond.2008.03.018

M3 - Article

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SP - 1164

EP - 1168

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 7-10

ER -

Unusual morphology of CVD diamond surfaces after RIE

Abstract

Keywords

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