Uniform nanoscopic polystyrene patterns produced from a microscopic mold

Hao L. Zhang; David G. Bucknall; Alexandre Dupuis

doi:10.1021/nl049285u

Uniform nanoscopic polystyrene patterns produced from a microscopic mold

Hao L. Zhang
, David G. Bucknall^*
, Alexandre Dupuis

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

39 Citations (Scopus)

Abstract

We demonstrate a molded dewetting (MD) process that is capable of producing highly regular and reproducible nanoscopic polymer patterns using a microscopic patterned mold. Theoretical simulations confirm that this MD process does not rely on specific interactions between the polymer and the substrate or the mold, hence it can be used for general purpose patterning. This nanoscale patterning method can also be combined with other approaches such as microcontact printing to produce complex structures.

Original language	English
Pages (from-to)	1513-1519
Number of pages	7
Journal	Nano Letters
Volume	4
Issue number	8
Early online date	10 Jul 2004
DOIs	https://doi.org/10.1021/nl049285u
Publication status	Published - Aug 2004

ASJC Scopus subject areas

General Materials Science

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10.1021/nl049285u

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title = "Uniform nanoscopic polystyrene patterns produced from a microscopic mold",

abstract = "We demonstrate a molded dewetting (MD) process that is capable of producing highly regular and reproducible nanoscopic polymer patterns using a microscopic patterned mold. Theoretical simulations confirm that this MD process does not rely on specific interactions between the polymer and the substrate or the mold, hence it can be used for general purpose patterning. This nanoscale patterning method can also be combined with other approaches such as microcontact printing to produce complex structures.",

author = "Zhang, \{Hao L.\} and Bucknall, \{David G.\} and Alexandre Dupuis",

year = "2004",

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AU - Zhang, Hao L.

AU - Bucknall, David G.

AU - Dupuis, Alexandre

PY - 2004/8

Y1 - 2004/8

N2 - We demonstrate a molded dewetting (MD) process that is capable of producing highly regular and reproducible nanoscopic polymer patterns using a microscopic patterned mold. Theoretical simulations confirm that this MD process does not rely on specific interactions between the polymer and the substrate or the mold, hence it can be used for general purpose patterning. This nanoscale patterning method can also be combined with other approaches such as microcontact printing to produce complex structures.

AB - We demonstrate a molded dewetting (MD) process that is capable of producing highly regular and reproducible nanoscopic polymer patterns using a microscopic patterned mold. Theoretical simulations confirm that this MD process does not rely on specific interactions between the polymer and the substrate or the mold, hence it can be used for general purpose patterning. This nanoscale patterning method can also be combined with other approaches such as microcontact printing to produce complex structures.

UR - https://www.scopus.com/pages/publications/4444289962

U2 - 10.1021/nl049285u

DO - 10.1021/nl049285u

M3 - Article

AN - SCOPUS:4444289962

SN - 1530-6984

VL - 4

SP - 1513

EP - 1519

JO - Nano Letters

JF - Nano Letters

IS - 8

ER -

Uniform nanoscopic polystyrene patterns produced from a microscopic mold

Abstract

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