Uniform nanoscopic polystyrene patterns produced from a microscopic mold

Hao L. Zhang, David G. Bucknall*, Alexandre Dupuis

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

38 Citations (Scopus)


We demonstrate a molded dewetting (MD) process that is capable of producing highly regular and reproducible nanoscopic polymer patterns using a microscopic patterned mold. Theoretical simulations confirm that this MD process does not rely on specific interactions between the polymer and the substrate or the mold, hence it can be used for general purpose patterning. This nanoscale patterning method can also be combined with other approaches such as microcontact printing to produce complex structures.

Original languageEnglish
Pages (from-to)1513-1519
Number of pages7
JournalNano Letters
Issue number8
Early online date10 Jul 2004
Publication statusPublished - Aug 2004

ASJC Scopus subject areas

  • Materials Science(all)


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