Ultrafast laser inscription: perspectives on future integrated applications

Debaditya Choudhury, John R. Macdonald, Ajoy K. Kar*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

183 Citations (Scopus)
124 Downloads (Pure)


This paper reviews the recent advancements achieved using ultrafast laser inscription (ULI) that highlight the cross-disciplinary potential of the technology. An overview of waveguide fabrication is provided and the three distinct types of waveguide cross-section architectures that have so far been fabricated in transparent dielectric materials are discussed. The paper focuses on two key emergent technologies driven by ULI processes. First, the recently developed photonic devices, such as compact mode-locked waveguide sources and novel mid-infrared waveguide lasers are discussed. Secondly, the phenomenon and applications of selective etching in developing ultrafast laser inscribed structures for compact lab-on-chip devices are elaborated. The review further discusses the conceivable future of ULI in impacting the aforementioned fields.

Original languageEnglish
Pages (from-to)827-846
Number of pages20
JournalLaser and Photonics Reviews
Issue number6
Early online date2 Jun 2014
Publication statusPublished - Nov 2014


  • Etching
  • Femtosecond
  • Microfluidics
  • Mid-infrared sources
  • Optofluidics
  • Ultrafast laser inscription
  • Waveguide lasers

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials


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