Abstract
Defect microstructures within heteroepitaxial layers may be categorized according to whether they arise due to problems at the epilayer/substrate interface, are introduced during growth itself or are due to some inherent materials problem. Examples taken from II-VI/GaAs systems showing interface reaction, lattice relaxation, banding due to compositional variations at the growth front and dimorphism are described. © 1994.
| Original language | English |
|---|---|
| Pages (from-to) | 538-544 |
| Number of pages | 7 |
| Journal | Journal of Crystal Growth |
| Volume | 138 |
| Issue number | 1-4 |
| Publication status | Published - 2 Apr 1994 |