Abstract
Defect microstructures within heteroepitaxial layers may be categorized according to whether they arise due to problems at the epilayer/substrate interface, are introduced during growth itself or are due to some inherent materials problem. Examples taken from II-VI/GaAs systems showing interface reaction, lattice relaxation, banding due to compositional variations at the growth front and dimorphism are described. © 1994.
Original language | English |
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Pages (from-to) | 538-544 |
Number of pages | 7 |
Journal | Journal of Crystal Growth |
Volume | 138 |
Issue number | 1-4 |
Publication status | Published - 2 Apr 1994 |