Abstract
The thermo-responsive behavior of polymer films consisting of novel linear triblock copolymers of poly(n-butyl methacrylate)-poly(methyl methacrylate)-poly(2-fluoroethyl methacrylate) (PnBuMA-PMMA-P2FEMA) are reported using differential scanning calorimetry (DSC), atomic forcing microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and contacting angle (CA) measurements. The surface morphology, wettability and chemical structure of thin films of these triblock copolymers on silicon wafers as a function of temperature have been investigated. It has been shown that the wettability of the films is thermally switchable. Detailed structural analysis shows that thermo-responsive surface composition changes are produced. The underlying mechanism of the thermoresponsive behavior is discussed. (C) 2011 Elsevier B.V. All rights reserved.
Original language | English |
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Pages (from-to) | 9673-9677 |
Number of pages | 5 |
Journal | Applied Surface Science |
Volume | 257 |
Issue number | 22 |
Early online date | 24 Jun 2011 |
DOIs | |
Publication status | Published - 1 Sept 2011 |
Keywords
- Block copolymers
- Thin films
- Stimuli-sensitive polymers
- Surface structure
- Wettability
- RAY PHOTOELECTRON-SPECTROSCOPY
- ATOMIC-FORCE MICROSCOPY
- BLOCK-COPOLYMERS
- POLY(VINYLIDENE FLUORIDE)
- SURFACE CHARACTERIZATION
- MICROPHASE SEPARATION
- RESPONSIVE SURFACES
- DIBLOCK COPOLYMERS
- HYDROPHOBIC BLOCK
- POLYMERS