The photochemical stability of collagen–chitosan blends

Alina Sionkowska, M Wisniewski, J Skopinska, Craig J Kennedy, Timothy J Wess

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    52 Citations (Scopus)

    Abstract

    The photochemical stability of collagen–chitosan blends in solution and film form was investigated using viscosimetry measurements,
    UV-Vis spectrophotometry, FTIR spectroscopy and wide angle X-ray diffraction. It was found that the relative viscosity of collagen
    decreased upon UV irradiation. The initial relative viscosity of collagen–chitosan blends were greater than the viscosity of collagen; upon
    UV irradiation the viscosity of the blends decreased rapidly. The absorption/scattering of collagen in solution increased during irradiation
    of the sample as shown by UV-Vis, indicating a conformational transition in the sample. FTIR showed that the amide A, B, I and II bands
    from collagen are shifted after UV irradiation to lower wave numbers; these shifts in collagen–chitosan blends are less well pronounced.
    Wide angle X-ray diffraction indicated that collagen and collagen–chitosan blends in film form retain much of their structural characteristics
    after irradiation.
    The viscosimetry andUV-Vis spectrophotometry results have shownthat solutions of collagen–chitosan blends are less stable photochemically
    than a pure collagen solution. FTIR spectra have shown, that collagen–chitosan blended films are also less stable photochemically
    than pure collagen films. Wide angle X-ray diffraction indicates that collagen and collagen–chitosan blend samples in film form are less
    susceptible to conformational change than equivalent samples in solution.
    Original languageEnglish
    Pages (from-to)545-554
    Number of pages10
    JournalJournal of Photochemistry and Photobiology A: Chemistry
    Volume162
    Issue number2-3
    DOIs
    Publication statusPublished - 15 Mar 2004

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