The oxidation of (100) textured diamond

P. John, N. Polwart, C. E. Troupe, J. I B Wilson

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The thermal oxidation of highly textured (100) chemical vapour deposited (CVD) diamond has been investigated using a combination of high resolution X-ray photoelectron spectroscopy. The diamond samples were oxidised in dry O2 in a vacuum furnace at temperatures up to 800 °C. The kinetics of oxidation of well-defined crystal facets of (100) diamond have been studied using in-situ laser interferometry and thermogravimetric analysis. Concomitant scanning probe microscopic examination of individual facets after oxidation revealed negligible changes to the surface roughness. Oxygen containing functional groups such as ether (COC) and carbonyl (>C=O) have been observed using X-ray photoelectron spectroscopy at all the surface coverages investigated. Even at higher coverages the formation of higher oxidation states such as carboxylic acid groupings was negligible (<2.5%). Angle resolved X-ray photoelectron spectroscopy measurements have been used to discriminate between surface and sub-surface oxygen. © 2002 Elsevier Science B.V. All rights reserved.

Original languageEnglish
Pages (from-to)861-866
Number of pages6
JournalDiamond and Related Materials
Issue number3-6
Publication statusPublished - Mar 2002


  • Etching
  • Photoelectron spectroscopy
  • Surface
  • Thermal-oxidation


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