Synthesis and characterization of freestanding diamond/carbon nanoflake hybrid films

J. K. Lee; P. John; S. C. Kim; W. S. Lee; J. I B Wilson

doi:10.1016/j.diamond.2008.01.002

Synthesis and characterization of freestanding diamond/carbon nanoflake hybrid films

J. K. Lee, P. John, S. C. Kim, W. S. Lee, J. I B Wilson

School of Engineering & Physical Sciences

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

Freestanding diamond/carbon nanoflake hybrid films have been synthesized by generating variable gas chemistries near a microstructured substrate in a conventional diamond deposition reactor. A multi-cathode direct current plasma enhanced CVD reactor, designed to deposit thick diamond wafers in its conventional configuration, has been used. The deposition conditions are identical to that for diamond films (10%CH₄ in H₂ gas, 100 Torr, 700-800 °C) except for a novel substrate. A sacrificial layer of silica micro-spheres (diameter 10-30 µm) was close-packed through gentle agitation of the spheres on a 100 mm diameter molybdenum disc. The growth of diamond and graphitic phases was observed on the front and back surfaces of the micro-spheres respectively. TEM observation confirmed that they were chemically bonded hybrid films without any distinguishable interlayer between the two phases. © 2008 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	1216-1220
Number of pages	5
Journal	Diamond and Related Materials
Volume	17
Issue number	7-10
DOIs	https://doi.org/10.1016/j.diamond.2008.01.002
Publication status	Published - Jul 2008

Keywords

Carbon
CVD
Diamond
Hybrid film
Nanoflakes
TEM

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10.1016/j.diamond.2008.01.002

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abstract = "Freestanding diamond/carbon nanoflake hybrid films have been synthesized by generating variable gas chemistries near a microstructured substrate in a conventional diamond deposition reactor. A multi-cathode direct current plasma enhanced CVD reactor, designed to deposit thick diamond wafers in its conventional configuration, has been used. The deposition conditions are identical to that for diamond films (10%CH4 in H2 gas, 100 Torr, 700-800 °C) except for a novel substrate. A sacrificial layer of silica micro-spheres (diameter 10-30 µm) was close-packed through gentle agitation of the spheres on a 100 mm diameter molybdenum disc. The growth of diamond and graphitic phases was observed on the front and back surfaces of the micro-spheres respectively. TEM observation confirmed that they were chemically bonded hybrid films without any distinguishable interlayer between the two phases. {\textcopyright} 2008 Elsevier B.V. All rights reserved.",

keywords = "Carbon, CVD, Diamond, Hybrid film, Nanoflakes, TEM",

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year = "2008",

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language = "English",

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T1 - Synthesis and characterization of freestanding diamond/carbon nanoflake hybrid films

AU - Lee, J. K.

AU - John, P.

AU - Kim, S. C.

AU - Lee, W. S.

AU - Wilson, J. I B

PY - 2008/7

Y1 - 2008/7

N2 - Freestanding diamond/carbon nanoflake hybrid films have been synthesized by generating variable gas chemistries near a microstructured substrate in a conventional diamond deposition reactor. A multi-cathode direct current plasma enhanced CVD reactor, designed to deposit thick diamond wafers in its conventional configuration, has been used. The deposition conditions are identical to that for diamond films (10%CH4 in H2 gas, 100 Torr, 700-800 °C) except for a novel substrate. A sacrificial layer of silica micro-spheres (diameter 10-30 µm) was close-packed through gentle agitation of the spheres on a 100 mm diameter molybdenum disc. The growth of diamond and graphitic phases was observed on the front and back surfaces of the micro-spheres respectively. TEM observation confirmed that they were chemically bonded hybrid films without any distinguishable interlayer between the two phases. © 2008 Elsevier B.V. All rights reserved.

AB - Freestanding diamond/carbon nanoflake hybrid films have been synthesized by generating variable gas chemistries near a microstructured substrate in a conventional diamond deposition reactor. A multi-cathode direct current plasma enhanced CVD reactor, designed to deposit thick diamond wafers in its conventional configuration, has been used. The deposition conditions are identical to that for diamond films (10%CH4 in H2 gas, 100 Torr, 700-800 °C) except for a novel substrate. A sacrificial layer of silica micro-spheres (diameter 10-30 µm) was close-packed through gentle agitation of the spheres on a 100 mm diameter molybdenum disc. The growth of diamond and graphitic phases was observed on the front and back surfaces of the micro-spheres respectively. TEM observation confirmed that they were chemically bonded hybrid films without any distinguishable interlayer between the two phases. © 2008 Elsevier B.V. All rights reserved.

KW - Carbon

KW - CVD

KW - Diamond

KW - Hybrid film

KW - Nanoflakes

KW - TEM

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DO - 10.1016/j.diamond.2008.01.002

M3 - Article

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EP - 1220

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 7-10

ER -

Synthesis and characterization of freestanding diamond/carbon nanoflake hybrid films

Abstract

Keywords

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