INIS
solvents
100%
processing
100%
aluminium oxides
100%
precursor
100%
chemistry
100%
chemical vapor deposition
100%
evaporation
57%
aerosols
42%
aluminum
42%
liquids
28%
droplets
28%
deposition
28%
scanning electron microscopy
14%
substrates
14%
size
14%
images
14%
comparative evaluations
14%
particles
14%
microstructure
14%
surfaces
14%
synthesis
14%
solids
14%
volatility
14%
injection
14%
coatings
14%
silicon
14%
toluene
14%
vapors
14%
temperature range
14%
morphology
14%
physical chemistry
14%
hexane
14%
Chemistry
Chemistry
100%
Metallorganic Chemical Vapor Deposition
100%
Aluminum Oxide
100%
Aluminum
75%
Scanning Electron Microscopy
25%
Solid Aerosol
25%
Physical Chemistry
25%
Silicon
25%
Diffusivity
25%
Hexane
25%
Engineering
Aluminum Oxide
100%
Silicon Substrate
25%
Temperature Range
25%
Experimental Observation
25%
Scoping Study
25%
Liquid Droplet
25%
Deposited Material
25%
Deposition Temperature
25%
Diffusivity
25%
Spheroidal Microstructure
25%
Material Science
Aluminum Oxide
100%
Aluminum
75%
Scanning Electron Microscopy
25%
Silicon
25%
Amorphous Material
25%
Diffusivity
25%
Morphology
25%
Chemical Engineering
Metallorganic Chemical Vapor Deposition
100%
Hexane
50%
Diffusion
50%