INIS
chemical vapor deposition
100%
coatings
28%
deposition
28%
energy
14%
films
100%
grain size
14%
growth
14%
increasing
14%
morphology
14%
organometallic compounds
14%
peaks
14%
precursor
14%
range
14%
reduction
14%
scanning electron microscopy
14%
silicon
100%
silicon nitrides
14%
substrates
100%
surfaces
14%
thickness
28%
thin films
14%
titanium
100%
titanium oxides
100%
x-ray diffraction
14%
x-ray spectroscopy
14%
Engineering
Conformality
50%
Deposition Temperature
100%
Energy Engineering
50%
Increasing Temperature
50%
Low-Temperature
50%
Metal Organic Chemical Vapor Deposition
50%
Nitride
50%
Peak Pressure
50%
Ray Diffraction
50%
Scanning Electron Microscope
50%
Silicon Substrate
100%
Slight Reduction
50%
Surface Morphology
50%
Thin Films
50%
Titania (Tio2)
50%
Material Science
Energy-Dispersive X-Ray Spectroscopy
22%
Film
100%
Grain Size
11%
Metal-Organic Chemical Vapor Deposition
11%
Scanning Electron Microscopy
11%
Silicon
100%
Silicon Nitride
11%
Surface Morphology
11%
Thin Films
11%
Titanium
11%
Titanium Dioxide
100%
X-Ray Diffraction
11%
Chemical Engineering
Chemical Vapor Deposition
12%
Metallorganic Chemical Vapor Deposition
100%
Silicon Nitride
12%
Titanium Dioxide
100%
Vapor Deposition
12%