INIS
titanium oxides
100%
substrates
100%
films
100%
titanium
100%
silicon
100%
chemical vapor deposition
100%
thickness
28%
coatings
28%
deposition
28%
growth
14%
scanning electron microscopy
14%
surfaces
14%
peaks
14%
x-ray diffraction
14%
reduction
14%
range
14%
energy
14%
thin films
14%
organometallic compounds
14%
increasing
14%
precursor
14%
morphology
14%
silicon nitrides
14%
grain size
14%
x-ray spectroscopy
14%
Engineering
Silicon Substrate
100%
Deposition Temperature
100%
Low-Temperature
50%
Increasing Temperature
50%
Ray Diffraction
50%
Peak Pressure
50%
Nitride
50%
Slight Reduction
50%
Conformality
50%
Metal Organic Chemical Vapor Deposition
50%
Titania (Tio2)
50%
Energy Engineering
50%
Thin Films
50%
Scanning Electron Microscope
50%
Surface Morphology
50%
Material Science
Film
100%
Titanium Dioxide
100%
Silicon
100%
Energy-Dispersive X-Ray Spectroscopy
22%
Scanning Electron Microscopy
11%
Surface Morphology
11%
Silicon Nitride
11%
Metal-Organic Chemical Vapor Deposition
11%
X-Ray Diffraction
11%
Grain Size
11%
Titanium
11%
Thin Films
11%
Chemical Engineering
Titanium Dioxide
100%
Metallorganic Chemical Vapor Deposition
100%
Chemical Vapor Deposition
12%
Silicon Nitride
12%
Vapor Deposition
12%