Small-angle X-ray scattering studies of a-Si: C:H

J. S. Rigden, C. D. Algar, R. J. Newport, A. N. North, F. Ibrahim, J. I B Wilson

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Abstract

Small-angle X-ray scattering studies have been performed on a series of four a-Si:C:H alloys, prepared by rf glow discharge decomposition of varying proportions of propane and silane, in an attempt to elucidate their mesoscopic structure. The observed broad scattering peak has been interpreted as originating from irregular, elongated voids with a repeat distance of about 20 Å and correlation length of about 25 Å. The implications of this result in explaining the photo-oxidation properties of the material are also discussed. © 1995.

Original languageEnglish
Pages (from-to)276-282
Number of pages7
JournalJournal of Non-Crystalline Solids
Volume190
Issue number3
Publication statusPublished - 2 Oct 1995

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    Rigden, J. S., Algar, C. D., Newport, R. J., North, A. N., Ibrahim, F., & Wilson, J. I. B. (1995). Small-angle X-ray scattering studies of a-Si: C:H. Journal of Non-Crystalline Solids, 190(3), 276-282.