Small-angle X-ray scattering studies of a-Si: C:H

J. S. Rigden, C. D. Algar, R. J. Newport, A. N. North, F. Ibrahim, J. I B Wilson

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


Small-angle X-ray scattering studies have been performed on a series of four a-Si:C:H alloys, prepared by rf glow discharge decomposition of varying proportions of propane and silane, in an attempt to elucidate their mesoscopic structure. The observed broad scattering peak has been interpreted as originating from irregular, elongated voids with a repeat distance of about 20 Å and correlation length of about 25 Å. The implications of this result in explaining the photo-oxidation properties of the material are also discussed. © 1995.

Original languageEnglish
Pages (from-to)276-282
Number of pages7
JournalJournal of Non-Crystalline Solids
Issue number3
Publication statusPublished - 2 Oct 1995


Dive into the research topics of 'Small-angle X-ray scattering studies of a-Si: C:H'. Together they form a unique fingerprint.

Cite this