Simulation of the fabrication infidelity of diffractive-optical elements by using halftone gray-scale masks

J. S. Liu, M. J. Thomson, M. R. Taghizadeh

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A model is set up to simulate the fabrication infidelity of diffractive-optical elements using halftone gray-scale masks, The infidelity includes, for different spatial frequencies, variations in maximum exposure depth in photoresist, relative transition width between adjacent ramps, and nonlinearity. The attenuation of the modulation transfer function (MTF) of the fabrication system at a high spatial frequency is the main reason for all the fabrication infidelity. The component whose MTF attenuates most in the fabrication system is generally photoreduction. © 2003 Society of Photo-Optical Instrumentation Engineers.

Original languageEnglish
Pages (from-to)334-339
Number of pages6
JournalOptical Engineering
Volume42
Issue number2
DOIs
Publication statusPublished - Feb 2003

Keywords

  • Diffractive optics
  • Halftone gray scale
  • Optical fabrication

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