Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography

H. Li, W. Yu, L. Zhang, Z. Liu, K. E. Brown, E. Abraham, S. Cargill, C. Tonry, M. K. Patel, C. Bailey, M. P. Y. Desmulliez

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

This article demonstrates, through finite element analysis, the possibility to manufacture sub-30 nm polymeric channels using electrostatic induced lithography. Channels with a width of 25 nm, a depth of 50 nm and an inter-channel wall of 28 nm can be obtained by this patterning process. The influence of operational parameters such as the filling factor, the aspect ratio of the master electrode, the applied voltage and the gap between the two electrodes and initial film thickness has been studied in detail to define the fabrication limits of this process in the case of periodic nanostructures. Conclusions for such nanostructures can be generalised to other shapes manufactured from polymers.
Original languageEnglish
Pages (from-to)11839-11845
Number of pages7
JournalRSC Advances
Volume3
Issue number29
Early online date30 Apr 2013
DOIs
Publication statusPublished - 7 Aug 2013

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