Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography

This article demonstrates, through finite element analysis, the possibility to manufacture sub-30 nm polymeric channels using electrostatic induced lithography. Channels with a width of 25 nm, a depth of 50 nm and an inter-channel wall of 28 nm can be obtained by this patterning process. The influence of operational parameters such as the filling factor, the aspect ratio of the master electrode, the applied voltage and the gap between the two electrodes and initial film thickness has been studied in detail to define the fabrication limits of this process in the case of periodic nanostructures. Conclusions for such nanostructures can be generalised to other shapes manufactured from polymers.