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SILICON CVD BY TWIN-BEAM PROCESSING.
David T. Binnie
, M. J. Colles
, J. I B Wilson
School of Engineering & Physical Sciences
Research output
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Chapter in Book/Report/Conference proceeding
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Conference contribution
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INIS
substrates
100%
beams
100%
processing
100%
silicon
100%
chemical vapor deposition
100%
carriers
66%
concentration
33%
surfaces
33%
gases
33%
deposits
33%
thin films
33%
deposition
33%
lasers
33%
argon ions
33%
silanes
33%
Engineering
Silicon Substrate
100%
Synergistic Effect
100%
Si Substrate
100%
Argon Ion Laser
100%
Flowing Gas
100%
Thin Films
100%
Chemical Vapor Deposition
100%
Conduction Band
100%
Material Science
Silicon
100%
Chemical Vapor Deposition
100%
Surface (Surface Science)
33%
Thin Films
33%