Self-assembly of polymer thin film on chemically patterned substrate

L. Zhang, H. L. Zhang, D. G. Bucknall

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

In this work, we have investigated phase separation behavior in PS/PVP polymer blend thin films on gold substrates that have chemical stripes of different periods made by microcontact printing. The influences of pattern period and film thickness have been studied. The experiments have testified that the best result of phase separation, as shown in OM image, was obtained when the period of the chemical pattern is similar to the polymer particle size. Meanwhile, the film thickness plays a significant role on the phase separation. The best pattern replication in the polymer thin films only occurs in a relative narrow thickness range, for example, in this case between 30 and 60 nm. The possible interaction mechanism of the thin polymer film with the underlayed chemical pattern has been discussed.

Original languageEnglish
Title of host publicationNanoscience and technology
PublisherTrans Tech Publications
Pages469-472
Number of pages4
Volume121-123
EditionPART 1
ISBN (Print)3908451302, 9783908451303
Publication statusPublished - 2007
EventChina International Conference on Nanoscience and Technology - Beijing, China
Duration: 9 Jun 200511 Jun 2005

Publication series

NameSolid State Phenomena
NumberPART 1
Volume121-123
ISSN (Print)10120394

Conference

ConferenceChina International Conference on Nanoscience and Technology
Abbreviated titleChinaNANO 2005
CountryChina
CityBeijing
Period9/06/0511/06/05

Keywords

  • Nano-scale pattern
  • Phase separation
  • Polymer blend
  • Soft-lithogarphy

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

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