Review of electrical characterization of ultra-shallow junctions with micro four-point probes

Dirch H. Petersen; Ole Hansen; Torben M. Hansen; Peter Boggild; Rong Lin; Daniel Kjaer; Peter F. Nielsen; Trudo Clarysse; Wilfried Vandervorst; Erik Rosseel; Nick S Bennett; Nick E. B. Cowern

doi:10.1116/1.3224898

Review of electrical characterization of ultra-shallow junctions with micro four-point probes

Dirch H. Petersen^*, Ole Hansen, Torben M. Hansen, Peter Boggild, Rong Lin, Daniel Kjaer, Peter F. Nielsen, Trudo Clarysse, Wilfried Vandervorst, Erik Rosseel, Nick S Bennett, Nick E. B. Cowern

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

39 Citations (Scopus)

Abstract

Electrical characterization of ultra-shallow junctions, relying on advanced implant and anneal processes, has received much attention in the past few years since conventional characterization methods fail. With continued scaling of semiconductor devices, the problems associated with conventional techniques will become even more evident. In several recent studies micro four-point probe (M4PP) has been demonstrated as a reliable high precision metrology method for both sheet resistance and Hall effect measurements of ultra-shallow implants and has revealed a promising potential for carrier profiling.

Original language	English
Pages (from-to)	C1C27-C1C33
Number of pages	7
Journal	Journal Vacuum Science and Technology B
Volume	28
Issue number	1
DOIs	https://doi.org/10.1116/1.3224898
Publication status	Published - Jan 2010

Keywords

electric variables measurement
electrical resistivity
Hall effect
reviews
semiconductor junctions
SHEET RESISTANCE MEASUREMENT
RESOLUTION
METROLOGY
SILICON
SI

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abstract = "Electrical characterization of ultra-shallow junctions, relying on advanced implant and anneal processes, has received much attention in the past few years since conventional characterization methods fail. With continued scaling of semiconductor devices, the problems associated with conventional techniques will become even more evident. In several recent studies micro four-point probe (M4PP) has been demonstrated as a reliable high precision metrology method for both sheet resistance and Hall effect measurements of ultra-shallow implants and has revealed a promising potential for carrier profiling.",

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AU - Petersen, Dirch H.

AU - Hansen, Ole

AU - Hansen, Torben M.

AU - Boggild, Peter

AU - Lin, Rong

AU - Kjaer, Daniel

AU - Nielsen, Peter F.

AU - Clarysse, Trudo

AU - Vandervorst, Wilfried

AU - Rosseel, Erik

AU - Bennett, Nick S

AU - Cowern, Nick E. B.

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KW - electric variables measurement

KW - electrical resistivity

KW - Hall effect

KW - reviews

KW - semiconductor junctions

KW - SHEET RESISTANCE MEASUREMENT

KW - RESOLUTION

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KW - SILICON

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JO - Journal Vacuum Science and Technology B

JF - Journal Vacuum Science and Technology B

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Review of electrical characterization of ultra-shallow junctions with micro four-point probes

Abstract

Keywords

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