Abstract
Modern orthopaedic bone implants and joint replacements employ hydroxyapatite (HA) coatings to stimulate bone growth. Metal Ti and Ta implants are also moving to rough and porous contact surfaces to enhance integration and long term stability. The current methods of applying HA to implants have problems with adhesion, and there is no MOCVD precursor system reported in the literature. We have investigated a methanolic MOCVD precursor solution of calcium-dibenzoylmethane and trimethylphosphate in combination with a unique pulsed-pressure MOCVD (PP-MOCVD) process to apply a thin adherent film of HA onto a tantalum implant scaffold material. This technique will allow use of multiple precursors and is not limited by precursor volatility. Calcium and phosphorous deposits were identified at depths of up to 4 mm on the tantalum scaffold sample by EDS analysis.
Original language | English |
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Pages (from-to) | 9413-9416 |
Number of pages | 4 |
Journal | Surface and Coatings Technology |
Volume | 201 |
Issue number | 22-23 |
DOIs | |
Publication status | Published - 25 Sept 2007 |
Keywords
- Bio-materials
- Hydroxyapatite
- MOCVD precursor development
- Pulsed-pressure MOCVD
ASJC Scopus subject areas
- General Chemistry
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry