Positional accuracy of optical vortex metrology (OVM)

Vivien Beyer, Wei Wang, Andrew J. Moore

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationFringe 2013 - 7th International Workshop on Advanced Optical Imaging and Metrology
PublisherSpringer
Pages329-332
Number of pages4
ISBN (Print)978-3-642-36358-0
DOIs
Publication statusPublished - 2014
Event7th International Workshop on Advanced Optical Imaging and Metrology, Fringe 2013 - Nurtingen, United Kingdom
Duration: 1 Jan 20141 Jan 2014

Conference

Conference7th International Workshop on Advanced Optical Imaging and Metrology, Fringe 2013
CountryUnited Kingdom
CityNurtingen
Period1/01/141/01/14

Cite this

Beyer, V., Wang, W., & Moore, A. J. (2014). Positional accuracy of optical vortex metrology (OVM). In Fringe 2013 - 7th International Workshop on Advanced Optical Imaging and Metrology (pp. 329-332). Springer. https://doi.org/10.1007/978-3-642-36359-7_58