Abstract
Plasma-enhanced chemical vapour deposition of chlorides has been used to deposit GeSe glass for infrared applications. Early results confirm that with suitable rf generators and deposition chamber geometry, the method should be capable of the high growth rates necessary for infrared fibre optic preforms. © 1985.
| Original language | English |
|---|---|
| Pages (from-to) | 1129-1132 |
| Number of pages | 4 |
| Journal | Journal of Non-Crystalline Solids |
| Volume | 77-78 |
| Issue number | PART 2 |
| Publication status | Published - 2 Dec 1985 |