TY - JOUR
T1 - Photo-oxidation of nitroso-compounds
T2 - Dissociative mechanism for the photo-oxidation of 2-methyl-2-nitrosobutane
AU - Pfab, Josef
PY - 1976
Y1 - 1976
N2 - The photo-oxidation of 2-methyl-2-nitrosopropane in the gas phase is shown to proceed by a dissociative mechanism via peroxyl and alkoxyl radicals and to provide a model system for the study of the oxidation of low levels of NO to NO2, which is of interest in studies of reactions occurring in photochemical smog.
AB - The photo-oxidation of 2-methyl-2-nitrosopropane in the gas phase is shown to proceed by a dissociative mechanism via peroxyl and alkoxyl radicals and to provide a model system for the study of the oxidation of low levels of NO to NO2, which is of interest in studies of reactions occurring in photochemical smog.
UR - http://www.scopus.com/inward/record.url?scp=37049092055&partnerID=8YFLogxK
U2 - 10.1039/C39760000297
DO - 10.1039/C39760000297
M3 - Article
SN - 0022-4936
SP - 297
EP - 298
JO - Journal of the Chemical Society, Chemical Communications
JF - Journal of the Chemical Society, Chemical Communications
IS - 8
ER -