Photo-oxidation of a-Si: C : H films

F. Ibrahim; J. I B Wilson; P. John

Photo-oxidation of a-Si: C : H films

F. Ibrahim, J. I B Wilson, P. John

School of Engineering & Physical Sciences

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

Glow-discharge a-Si_1-x:C_x:H deposited from silane and propane have been studied in the high carbon concentration range (x~0.5 to ~0.7, according to XPS) in view of their interesting photo-oxidation property. These carbon-rich films have three dominant microstructures: diamond-like, porous and polymer-like, at increasing carbon composition. The basic polymeric unit is CH₂, and the porosity is due to the SiCH₃ bond terminating groups. The ease of photo-oxidation, as measured by the depth of the oxide after periods of UV illumination, correlates with the porosity of these films, rather than a simple correlation with carbon content. © 1993.

Original language	English
Pages (from-to)	1051-1054
Number of pages	4
Journal	Journal of Non-Crystalline Solids
Volume	164-166
Issue number	PART 2
Publication status	Published - 2 Dec 1993

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title = "Photo-oxidation of a-Si: C : H films",

abstract = "Glow-discharge a-Si1-x:Cx:H deposited from silane and propane have been studied in the high carbon concentration range (x~0.5 to ~0.7, according to XPS) in view of their interesting photo-oxidation property. These carbon-rich films have three dominant microstructures: diamond-like, porous and polymer-like, at increasing carbon composition. The basic polymeric unit is CH2, and the porosity is due to the SiCH3 bond terminating groups. The ease of photo-oxidation, as measured by the depth of the oxide after periods of UV illumination, correlates with the porosity of these films, rather than a simple correlation with carbon content. {\textcopyright} 1993.",

author = "F. Ibrahim and Wilson, {J. I B} and P. John",

year = "1993",

month = dec,

day = "2",

language = "English",

volume = "164-166",

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TY - JOUR

T1 - Photo-oxidation of a-Si

T2 - C : H films

AU - Ibrahim, F.

AU - Wilson, J. I B

AU - John, P.

PY - 1993/12/2

Y1 - 1993/12/2

N2 - Glow-discharge a-Si1-x:Cx:H deposited from silane and propane have been studied in the high carbon concentration range (x~0.5 to ~0.7, according to XPS) in view of their interesting photo-oxidation property. These carbon-rich films have three dominant microstructures: diamond-like, porous and polymer-like, at increasing carbon composition. The basic polymeric unit is CH2, and the porosity is due to the SiCH3 bond terminating groups. The ease of photo-oxidation, as measured by the depth of the oxide after periods of UV illumination, correlates with the porosity of these films, rather than a simple correlation with carbon content. © 1993.

AB - Glow-discharge a-Si1-x:Cx:H deposited from silane and propane have been studied in the high carbon concentration range (x~0.5 to ~0.7, according to XPS) in view of their interesting photo-oxidation property. These carbon-rich films have three dominant microstructures: diamond-like, porous and polymer-like, at increasing carbon composition. The basic polymeric unit is CH2, and the porosity is due to the SiCH3 bond terminating groups. The ease of photo-oxidation, as measured by the depth of the oxide after periods of UV illumination, correlates with the porosity of these films, rather than a simple correlation with carbon content. © 1993.

M3 - Article

SN - 0022-3093

VL - 164-166

SP - 1051

EP - 1054

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

IS - PART 2

ER -

Photo-oxidation of a-Si: C : H films

Abstract

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