INIS
thin films
100%
deposition
100%
lasers
100%
vanadium oxides
100%
substrates
66%
metals
66%
thickness
33%
width
33%
films
33%
antennas
33%
hysteresis
33%
annealing
33%
growth
16%
applications
16%
yields
16%
oxygen
16%
amplitudes
16%
atmospheres
16%
switches
16%
fabrication
16%
microwave radiation
16%
sapphire
16%
ablation
16%
nanoparticles
16%
grain size
16%
transition temperature
16%
Material Science
Pulsed Laser Deposition
100%
Vanadium
100%
Thin Films
100%
Crystalline Material
50%
Annealing
33%
Electrical Resistivity
16%
Sapphire
16%
Nanoparticle
16%
Film Thickness
16%
Film
16%
Grain Size
16%
Amorphous Material
16%
Engineering
Pulsed Laser
100%
Thin Films
100%
Substrate Temperature
50%
Antenna
33%
Potential Application
16%
Fabrication Method
16%
Sapphire Substrate
16%
Terahertz
16%
Annealing Process
16%
Nanoparticles
16%