Patternation of polymer structures by guided anisotropic dewetting

Hao L. Zhang, David G. Bucknall

Research output: Contribution to journalArticle

Abstract

We demonstrate a simple method based on a guided anisotropic dewetting process, which allows making polymer patterns with features size much smaller than those on the mold. In this approach an elastometric mold is used to control the dewetting process of thin polymer films. Because the polymer is chosen that it has higher affinity to the mold than to the substrate, when heated above its glass transition temperature (Tg) the polymer dewets under the guidance of the mold. Very uniform lines with characteristic feature size beyond that of the mold can be obtained. This approach can be applied to very large areas and has shown good reproducibility.

Original languageEnglish
Article numberM12.9
Pages (from-to)195-197
Number of pages3
JournalMRS Online Proceedings Library
VolumeEXS
Issue number2
Publication statusPublished - 1 Jan 2004

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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