Abstract
We report for the first time the generation of optimized space-invariant fan-out elements, so-called Dammann gratings [H. Dammann and K. Görtler, Opt. Commun. 3, 312 (1971)] in plasma silicon nitride. Diffraction efficiencies as high as 65% have been achieved. Using simulated annealing and the greedy algorithm, grating structures with fan-out as large as 201×201 can readily be calculated. Low absorption and high optical quality together with its ease of structuring make silicon nitride an ideal medium for the construction of phase-only optical elements.
| Original language | English |
|---|---|
| Pages (from-to) | 1492-1494 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 54 |
| Issue number | 16 |
| DOIs | |
| Publication status | Published - 1989 |
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