Optimization and fabrication of grating beamsplitters in silicon nitride

M. R. Taghizadeh; J. I B Wilson; J. Turunen; A. Vasara; J. Westerholm

doi:10.1063/1.101331

Optimization and fabrication of grating beamsplitters in silicon nitride

M. R. Taghizadeh, J. I B Wilson, J. Turunen, A. Vasara, J. Westerholm

School of Engineering & Physical Sciences

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26 Citations (Scopus)

Abstract

We report for the first time the generation of optimized space-invariant fan-out elements, so-called Dammann gratings [H. Dammann and K. Görtler, Opt. Commun. 3, 312 (1971)] in plasma silicon nitride. Diffraction efficiencies as high as 65% have been achieved. Using simulated annealing and the greedy algorithm, grating structures with fan-out as large as 201×201 can readily be calculated. Low absorption and high optical quality together with its ease of structuring make silicon nitride an ideal medium for the construction of phase-only optical elements.

Original language	English
Pages (from-to)	1492-1494
Number of pages	3
Journal	Applied Physics Letters
Volume	54
Issue number	16
DOIs	https://doi.org/10.1063/1.101331
Publication status	Published - 1989

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AU - Wilson, J. I B

AU - Turunen, J.

AU - Vasara, A.

AU - Westerholm, J.

PY - 1989

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Optimization and fabrication of grating beamsplitters in silicon nitride

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