Optimality of pupil-phase profiles for increasing the defocus tolerance of hybrid digital-optical imaging systems

Tom Vettenburg, Andrew Wood, Nicholas Bustin, Andrew R. Harvey

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)


A phase mask at the aperture stop of a hybrid digital-optical imaging system can improve its tolerance to aberrations. The choice of the introduced phase modulation is crucial in the design of such systems. Several successful phase masks have been described in the literature. These masks are typically derived by searching for optical-transfer-functions that retain restorability under aberrations such as defocus. Instead of optimizing the optical-transfer-function for some desired characteristics, we calculate the expected imaging error of the joint design directly. This was used to compare thirddegree polynomial phase masks, including the cubic phase profile and a commonly used generalization. The analysis shows how the optimal phase profile depth is always limited by noise and more importantly, numerical simulations show that only a finite range of the third-degree polynomial profiles yield optimal performance. © 2009 Copyright SPIE - The International Society for Optical Engineering.

Original languageEnglish
Title of host publicationNovel Optical Systems Design and Optimization XII
Publication statusPublished - 2009
EventSpintronics II - San Diego, CA, United States
Duration: 2 Aug 20095 Aug 2009


ConferenceSpintronics II
Country/TerritoryUnited States
CitySan Diego, CA


  • aberration control
  • Computational imaging
  • defocus tolerance
  • design optimization
  • hybrid optical-digital imaging
  • phase mask
  • PSF-engineering
  • pupil-phase engineering
  • wavefront-coding


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