Nanolithography and Patterning Techniques in Microelectronics

David G. Bucknall* (Editor)

*Corresponding author for this work

Research output: Book/ReportBook

39 Citations (Scopus)


Techniques such as surface patterning have facilitated the emergence of advanced polymers with applications in areas such as microelectronics. Surface patterning of polymers has conventionally been undertaken by optical lithography. However, a new generation of nanolithographic and patterning techniques has made it possible to develop complex patterns at the nanoscale. Non-conventional lithography and patterning summarises this new range of techniques and their industrial applications. A number of chapters look at ways of forming and modifying surfaces for patterning. These are complemented by chapters on particular patterning techniques such as soft lithography, ion beam patterning, the use of nanostencils, photolithography and inkjet printing. The book also discusses prototyping and the manufacture of particular devices. With its distinguished international team of contributors, Non-conventional lithography and patterning is a standard reference for both those researching and using advanced polymers in such areas as microelectronics and biomedical devices.

Original languageEnglish
Number of pages424
ISBN (Print)9781855739314
Publication statusPublished - 2005

ASJC Scopus subject areas

  • General Engineering


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