Nanocrystalline diamond films for nanotechnology applications

I. S. Forbes; J. R. Rabeau; J. I B Wilson; P. John

doi:10.1179/026708303225009328

Nanocrystalline diamond films for nanotechnology applications

I. S. Forbes, J. R. Rabeau, J. I B Wilson, P. John

School of Engineering & Physical Sciences

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Nanocrystalline diamond films with rms roughnesses in the order of 50 nm have been prepared by microwave plasma enhanced chemical vapour deposition. Ar - CH₄ gas mixtures have been used in a coaxially bladed reactor, and Ar -H₂ - CH4 gas mixtures have been used in a reactor with a dual mode microwave applicator. These films have been examined by ultraviolet and visible Raman spectroscopy. They have been subjected to nanotribological investigation, with a view to their incorporation into microelectromechanical systems (MEMS). Comparisons with other diamond and hard carbon films are made, and the advantages of nanocrystalline diamond films are discussed.

Original language	English
Pages (from-to)	553-556
Number of pages	4
Journal	Materials Science and Technology
Volume	19
Issue number	5
DOIs	https://doi.org/10.1179/026708303225009328
Publication status	Published - 1 May 2003

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abstract = "Nanocrystalline diamond films with rms roughnesses in the order of 50 nm have been prepared by microwave plasma enhanced chemical vapour deposition. Ar - CH4 gas mixtures have been used in a coaxially bladed reactor, and Ar -H2 - CH4 gas mixtures have been used in a reactor with a dual mode microwave applicator. These films have been examined by ultraviolet and visible Raman spectroscopy. They have been subjected to nanotribological investigation, with a view to their incorporation into microelectromechanical systems (MEMS). Comparisons with other diamond and hard carbon films are made, and the advantages of nanocrystalline diamond films are discussed.",

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AU - Rabeau, J. R.

AU - Wilson, J. I B

AU - John, P.

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N2 - Nanocrystalline diamond films with rms roughnesses in the order of 50 nm have been prepared by microwave plasma enhanced chemical vapour deposition. Ar - CH4 gas mixtures have been used in a coaxially bladed reactor, and Ar -H2 - CH4 gas mixtures have been used in a reactor with a dual mode microwave applicator. These films have been examined by ultraviolet and visible Raman spectroscopy. They have been subjected to nanotribological investigation, with a view to their incorporation into microelectromechanical systems (MEMS). Comparisons with other diamond and hard carbon films are made, and the advantages of nanocrystalline diamond films are discussed.

AB - Nanocrystalline diamond films with rms roughnesses in the order of 50 nm have been prepared by microwave plasma enhanced chemical vapour deposition. Ar - CH4 gas mixtures have been used in a coaxially bladed reactor, and Ar -H2 - CH4 gas mixtures have been used in a reactor with a dual mode microwave applicator. These films have been examined by ultraviolet and visible Raman spectroscopy. They have been subjected to nanotribological investigation, with a view to their incorporation into microelectromechanical systems (MEMS). Comparisons with other diamond and hard carbon films are made, and the advantages of nanocrystalline diamond films are discussed.

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EP - 556

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JF - Materials Science and Technology

IS - 5

ER -

Nanocrystalline diamond films for nanotechnology applications

Abstract

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