Nanocrystalline diamond films for nanotechnology applications

I. S. Forbes, J. R. Rabeau, J. I B Wilson, P. John

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Nanocrystalline diamond films with rms roughnesses in the order of 50 nm have been prepared by microwave plasma enhanced chemical vapour deposition. Ar - CH4 gas mixtures have been used in a coaxially bladed reactor, and Ar -H2 - CH4 gas mixtures have been used in a reactor with a dual mode microwave applicator. These films have been examined by ultraviolet and visible Raman spectroscopy. They have been subjected to nanotribological investigation, with a view to their incorporation into microelectromechanical systems (MEMS). Comparisons with other diamond and hard carbon films are made, and the advantages of nanocrystalline diamond films are discussed.

Original languageEnglish
Pages (from-to)553-556
Number of pages4
JournalMaterials Science and Technology
Volume19
Issue number5
DOIs
Publication statusPublished - 1 May 2003

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