Abstract
We report the use of an electrochemical iodine cell to dope epitaxial ZnSe grown by molecular beam epitaxy over a range of carrier concentrations from 1015 to 1019 cm-3. The doping levels throughout the layers have been measured by electrochemical CV profiling and staircase doping structures have been used to calibrate the doping level in terms of the cell flux. Photoluminescence and Hall data confirm the growth of well-behaved n-type ZnSe.
Original language | English |
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Pages (from-to) | 464-465 |
Number of pages | 2 |
Journal | Semiconductor Science and Technology |
Volume | 7 |
Issue number | 4 |
DOIs | |
Publication status | Published - Apr 1992 |