Multilevel grating array illuminators manufactured by electron-beam lithography

Mats Ekberg; Michael Larsson; Sverker Hård; Jari Turunen; Mohammad R. Taghizadeh; Jan Westerholm; Antti Vasara

Multilevel grating array illuminators manufactured by electron-beam lithography

Mats Ekberg
, Michael Larsson
, Sverker Hård
, Jari Turunen
, Mohammad R. Taghizadeh
, Jan Westerholm
, Antti Vasara

School of Engineering & Physical Sciences

Research output: Contribution to journal › Article › peer-review

27 Citations (Scopus)

Abstract

Two-dimensional multilevel grating array generators with regular M×N fan-out patterns are designed using both nonlinear optimization and an iterative phase retrieval algorithm. Ten-level designs with fan-out of 2×2, 4×4, 1×8, and 8×8, with design efficiencies of 87%, 92%, 95% and 89% are manufactured using direct electron-beam lithography on electron resist. The measured efficiencies, 79%, 84%, 84% and 84% of transmitted light, respectively, are ~ 10% above the theoretical efficiencies of non-separable binary-phase array illuminators. © 1992.

Original language	English
Pages (from-to)	37-41
Number of pages	5
Journal	Optics Communications
Volume	88
Issue number	1
Publication status	Published - 1 Mar 1992

Cite this

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title = "Multilevel grating array illuminators manufactured by electron-beam lithography",

abstract = "Two-dimensional multilevel grating array generators with regular M×N fan-out patterns are designed using both nonlinear optimization and an iterative phase retrieval algorithm. Ten-level designs with fan-out of 2×2, 4×4, 1×8, and 8×8, with design efficiencies of 87\%, 92\%, 95\% and 89\% are manufactured using direct electron-beam lithography on electron resist. The measured efficiencies, 79\%, 84\%, 84\% and 84\% of transmitted light, respectively, are \textasciitilde{} 10\% above the theoretical efficiencies of non-separable binary-phase array illuminators. {\textcopyright} 1992.",

author = "Mats Ekberg and Michael Larsson and Sverker H{\aa}rd and Jari Turunen and Taghizadeh, \{Mohammad R.\} and Jan Westerholm and Antti Vasara",

year = "1992",

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language = "English",

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T1 - Multilevel grating array illuminators manufactured by electron-beam lithography

AU - Ekberg, Mats

AU - Larsson, Michael

AU - Hård, Sverker

AU - Turunen, Jari

AU - Taghizadeh, Mohammad R.

AU - Westerholm, Jan

AU - Vasara, Antti

PY - 1992/3/1

Y1 - 1992/3/1

N2 - Two-dimensional multilevel grating array generators with regular M×N fan-out patterns are designed using both nonlinear optimization and an iterative phase retrieval algorithm. Ten-level designs with fan-out of 2×2, 4×4, 1×8, and 8×8, with design efficiencies of 87%, 92%, 95% and 89% are manufactured using direct electron-beam lithography on electron resist. The measured efficiencies, 79%, 84%, 84% and 84% of transmitted light, respectively, are ~ 10% above the theoretical efficiencies of non-separable binary-phase array illuminators. © 1992.

AB - Two-dimensional multilevel grating array generators with regular M×N fan-out patterns are designed using both nonlinear optimization and an iterative phase retrieval algorithm. Ten-level designs with fan-out of 2×2, 4×4, 1×8, and 8×8, with design efficiencies of 87%, 92%, 95% and 89% are manufactured using direct electron-beam lithography on electron resist. The measured efficiencies, 79%, 84%, 84% and 84% of transmitted light, respectively, are ~ 10% above the theoretical efficiencies of non-separable binary-phase array illuminators. © 1992.

M3 - Article

SN - 0030-4018

VL - 88

SP - 37

EP - 41

JO - Optics Communications

JF - Optics Communications

IS - 1

ER -

Multilevel grating array illuminators manufactured by electron-beam lithography

Abstract

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