TY - JOUR
T1 - Multilevel grating array illuminators manufactured by electron-beam lithography
AU - Ekberg, Mats
AU - Larsson, Michael
AU - Hård, Sverker
AU - Turunen, Jari
AU - Taghizadeh, Mohammad R.
AU - Westerholm, Jan
AU - Vasara, Antti
PY - 1992/3/1
Y1 - 1992/3/1
N2 - Two-dimensional multilevel grating array generators with regular M×N fan-out patterns are designed using both nonlinear optimization and an iterative phase retrieval algorithm. Ten-level designs with fan-out of 2×2, 4×4, 1×8, and 8×8, with design efficiencies of 87%, 92%, 95% and 89% are manufactured using direct electron-beam lithography on electron resist. The measured efficiencies, 79%, 84%, 84% and 84% of transmitted light, respectively, are ~ 10% above the theoretical efficiencies of non-separable binary-phase array illuminators. © 1992.
AB - Two-dimensional multilevel grating array generators with regular M×N fan-out patterns are designed using both nonlinear optimization and an iterative phase retrieval algorithm. Ten-level designs with fan-out of 2×2, 4×4, 1×8, and 8×8, with design efficiencies of 87%, 92%, 95% and 89% are manufactured using direct electron-beam lithography on electron resist. The measured efficiencies, 79%, 84%, 84% and 84% of transmitted light, respectively, are ~ 10% above the theoretical efficiencies of non-separable binary-phase array illuminators. © 1992.
M3 - Article
SN - 0030-4018
VL - 88
SP - 37
EP - 41
JO - Optics Communications
JF - Optics Communications
IS - 1
ER -