A new basis is presented for the calculation of reflection coefficients of x-rays by multilayer artifacts. Thin film interference is treated at atomic plane level, using an iterative 2 multiplied by 2 matrix method. Analytic and computational comparisons are made with the conventional dielectric approach for TM and TE polarisations at non-normal incidence. Good agreement is obtained with recent accurate measurements by Evans.
|Title of host publication||Proceedings of SPIE - The International Society for Optical Engineering|
|Number of pages||9|
|Publication status||Published - 1987|