Abstract
A new basis is presented for the calculation of reflection coefficients of x-rays by multilayer artifacts. Thin film interference is treated at atomic plane level, using an iterative 2 multiplied by 2 matrix method. Analytic and computational comparisons are made with the conventional dielectric approach for TM and TE polarisations at non-normal incidence. Good agreement is obtained with recent accurate measurements by Evans.
| Original language | English |
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| Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
| Pages | 324-332 |
| Number of pages | 9 |
| Volume | 733 |
| Publication status | Published - 1987 |