Morphological and electrical analysis of micron scale Si lines produced by laser-induced chemical vapor deposition

T. D. Binnie, J. I B Wilson, M. J. Colles, J. L. West

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

We report morphological and electrical differences in micron scale silicon lines deposited by laser-induced chemical vapor deposition, using a range of laser powers and scan rates. We also show how changes in substrate reflectivity can affect and control the deposition reaction.

Original languageEnglish
Pages (from-to)4446-4448
Number of pages3
JournalJournal of Applied Physics
Volume58
Issue number11
DOIs
Publication statusPublished - 1985

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