Morphological and electrical analysis of micron scale Si lines produced by laser-induced chemical vapor deposition

T. D. Binnie; J. I B Wilson; M. J. Colles; J. L. West

doi:10.1063/1.336275

Morphological and electrical analysis of micron scale Si lines produced by laser-induced chemical vapor deposition

T. D. Binnie, J. I B Wilson, M. J. Colles, J. L. West

School of Engineering & Physical Sciences

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

We report morphological and electrical differences in micron scale silicon lines deposited by laser-induced chemical vapor deposition, using a range of laser powers and scan rates. We also show how changes in substrate reflectivity can affect and control the deposition reaction.

Original language	English
Pages (from-to)	4446-4448
Number of pages	3
Journal	Journal of Applied Physics
Volume	58
Issue number	11
DOIs	https://doi.org/10.1063/1.336275
Publication status	Published - 1985

Access to Document

10.1063/1.336275

Cite this

@article{e93cfd4056bc40349709708f423c8131,

title = "Morphological and electrical analysis of micron scale Si lines produced by laser-induced chemical vapor deposition",

abstract = "We report morphological and electrical differences in micron scale silicon lines deposited by laser-induced chemical vapor deposition, using a range of laser powers and scan rates. We also show how changes in substrate reflectivity can affect and control the deposition reaction.",

author = "Binnie, {T. D.} and Wilson, {J. I B} and Colles, {M. J.} and West, {J. L.}",

year = "1985",

doi = "10.1063/1.336275",

language = "English",

volume = "58",

pages = "4446--4448",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "11",

}

TY - JOUR

T1 - Morphological and electrical analysis of micron scale Si lines produced by laser-induced chemical vapor deposition

AU - Binnie, T. D.

AU - Wilson, J. I B

AU - Colles, M. J.

AU - West, J. L.

PY - 1985

Y1 - 1985

N2 - We report morphological and electrical differences in micron scale silicon lines deposited by laser-induced chemical vapor deposition, using a range of laser powers and scan rates. We also show how changes in substrate reflectivity can affect and control the deposition reaction.

AB - We report morphological and electrical differences in micron scale silicon lines deposited by laser-induced chemical vapor deposition, using a range of laser powers and scan rates. We also show how changes in substrate reflectivity can affect and control the deposition reaction.

U2 - 10.1063/1.336275

DO - 10.1063/1.336275

M3 - Article

SN - 0021-8979

VL - 58

SP - 4446

EP - 4448

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 11

ER -

Morphological and electrical analysis of micron scale Si lines produced by laser-induced chemical vapor deposition

Abstract

Access to Document

Fingerprint

Cite this