Modelling the Nano-Imprint Forming process for the production of miniaturised 3D structures

Stoyan Stoyanov; Farid Amalou; Keith Sinclair; Chris Bailey; M. P Y Desmulliez

doi:10.1109/ESIME.2008.4525088

Modelling the Nano-Imprint Forming process for the production of miniaturised 3D structures

Stoyan Stoyanov
, Farid Amalou
, Keith Sinclair
, Chris Bailey
, M. P Y Desmulliez

School of Engineering & Physical Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

Nano-Imprint Forming (NIF) as manufacturing technology is ideally placed to enable high resolution, low-cost and high-throughput fabrication of three-dimensional fine structures and the packaging of heterogeneous micro-systems [1]. This paper details a thermo-mechanical modelling methodology for optimising this process for different materials used in components such as mini-fluidics and bio-chemical systems, optoelectronics, photonics and health usage monitoring systems (HUMS). This work is part of a major UK Grand Challenge project - 3D-Mintegration - which is aiming to develop modelling and design technologies for the next generation of fabrication, assembly and test processes for 3D-miniaturised systems. ©2008 IEEE.

Original language	English
Title of host publication	EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems
DOIs	https://doi.org/10.1109/ESIME.2008.4525088
Publication status	Published - 2008
Event	EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems - Freiburg im Breisgau, Germany Duration: 20 Apr 2008 → 23 Apr 2008

Conference

Conference	EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems
Country/Territory	Germany
City	Freiburg im Breisgau
Period	20/04/08 → 23/04/08

Access to Document

10.1109/ESIME.2008.4525088

Cite this

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title = "Modelling the Nano-Imprint Forming process for the production of miniaturised 3D structures",

abstract = "Nano-Imprint Forming (NIF) as manufacturing technology is ideally placed to enable high resolution, low-cost and high-throughput fabrication of three-dimensional fine structures and the packaging of heterogeneous micro-systems [1]. This paper details a thermo-mechanical modelling methodology for optimising this process for different materials used in components such as mini-fluidics and bio-chemical systems, optoelectronics, photonics and health usage monitoring systems (HUMS). This work is part of a major UK Grand Challenge project - 3D-Mintegration - which is aiming to develop modelling and design technologies for the next generation of fabrication, assembly and test processes for 3D-miniaturised systems. {\textcopyright}2008 IEEE.",

author = "Stoyan Stoyanov and Farid Amalou and Keith Sinclair and Chris Bailey and Desmulliez, \{M. P Y\}",

year = "2008",

doi = "10.1109/ESIME.2008.4525088",

language = "English",

isbn = "9781424421282",

booktitle = "EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems",

note = "EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems ; Conference date: 20-04-2008 Through 23-04-2008",

}

Stoyanov, S, Amalou, F, Sinclair, K, Bailey, C & Desmulliez, MPY 2008, Modelling the Nano-Imprint Forming process for the production of miniaturised 3D structures. in EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems. EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems, Freiburg im Breisgau, Germany, 20/04/08. https://doi.org/10.1109/ESIME.2008.4525088

Modelling the Nano-Imprint Forming process for the production of miniaturised 3D structures. / Stoyanov, Stoyan; Amalou, Farid; Sinclair, Keith et al.
EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems. 2008.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Modelling the Nano-Imprint Forming process for the production of miniaturised 3D structures

AU - Stoyanov, Stoyan

AU - Amalou, Farid

AU - Sinclair, Keith

AU - Bailey, Chris

AU - Desmulliez, M. P Y

PY - 2008

Y1 - 2008

N2 - Nano-Imprint Forming (NIF) as manufacturing technology is ideally placed to enable high resolution, low-cost and high-throughput fabrication of three-dimensional fine structures and the packaging of heterogeneous micro-systems [1]. This paper details a thermo-mechanical modelling methodology for optimising this process for different materials used in components such as mini-fluidics and bio-chemical systems, optoelectronics, photonics and health usage monitoring systems (HUMS). This work is part of a major UK Grand Challenge project - 3D-Mintegration - which is aiming to develop modelling and design technologies for the next generation of fabrication, assembly and test processes for 3D-miniaturised systems. ©2008 IEEE.

AB - Nano-Imprint Forming (NIF) as manufacturing technology is ideally placed to enable high resolution, low-cost and high-throughput fabrication of three-dimensional fine structures and the packaging of heterogeneous micro-systems [1]. This paper details a thermo-mechanical modelling methodology for optimising this process for different materials used in components such as mini-fluidics and bio-chemical systems, optoelectronics, photonics and health usage monitoring systems (HUMS). This work is part of a major UK Grand Challenge project - 3D-Mintegration - which is aiming to develop modelling and design technologies for the next generation of fabrication, assembly and test processes for 3D-miniaturised systems. ©2008 IEEE.

UR - https://www.scopus.com/pages/publications/49249116038

U2 - 10.1109/ESIME.2008.4525088

DO - 10.1109/ESIME.2008.4525088

M3 - Conference contribution

SN - 9781424421282

BT - EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems

T2 - EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems

Y2 - 20 April 2008 through 23 April 2008

ER -

Modelling the Nano-Imprint Forming process for the production of miniaturised 3D structures

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