Modelling the Nano-Imprint Forming process for the production of miniaturised 3D structures

Stoyan Stoyanov, Farid Amalou, Keith Sinclair, Chris Bailey, M. P Y Desmulliez

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Nano-Imprint Forming (NIF) as manufacturing technology is ideally placed to enable high resolution, low-cost and high-throughput fabrication of three-dimensional fine structures and the packaging of heterogeneous micro-systems [1]. This paper details a thermo-mechanical modelling methodology for optimising this process for different materials used in components such as mini-fluidics and bio-chemical systems, optoelectronics, photonics and health usage monitoring systems (HUMS). This work is part of a major UK Grand Challenge project - 3D-Mintegration - which is aiming to develop modelling and design technologies for the next generation of fabrication, assembly and test processes for 3D-miniaturised systems. ©2008 IEEE.

Original languageEnglish
Title of host publicationEuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems
DOIs
Publication statusPublished - 2008
EventEuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems - Freiburg im Breisgau, Germany
Duration: 20 Apr 200823 Apr 2008

Conference

ConferenceEuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems
CountryGermany
CityFreiburg im Breisgau
Period20/04/0823/04/08

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