| Original language | English |
|---|---|
| Article number | 252109 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 94 |
| Issue number | 25 |
| DOIs | |
| Publication status | Published - 26 Jun 2009 |
Model for electron mobility as a function of carrier concentration and strain in heavily doped strained silicon
N. S. Bennett, N. E. B. Cowern, B. J. Sealy
Research output: Contribution to journal › Article › peer-review
17
Citations
(Scopus)