Minimising the risk of defects in nano-imprint forming

Stoyan Stoyanov; Farid Amalou; Keith Sinclair; Chris Bailey; Marc Desmulliez

doi:10.1109/ISSE.2008.5276670

Minimising the risk of defects in nano-imprint forming

Stoyan Stoyanov, Farid Amalou, Keith Sinclair, Chris Bailey, Marc Desmulliez

School of Engineering & Physical Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Nano-Imprint Forming (NIF) is among the most attractive manufacturing technologies offering high yield and low-cost fabrication of three-dimensional fine structures and patterns with resolution of few nanometres [1]. Optimising NIF process is critical for achieving high quality products and minimising the risk of commonly observed defects. Using Finite Element Analysis, the effect of various process parameters is evaluated and design rules for safe and reliable NIF fabrication formulated. This work is part of a major UK Grand Challenge project - 3D-Mintegration - for design, simulation, fabrication, assembly and test of next generation 3D-miniaturised systems. ©2008 IEEE.

Original language	English
Title of host publication	2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction, ISSE 2008
Pages	367-372
Number of pages	6
DOIs	https://doi.org/10.1109/ISSE.2008.5276670
Publication status	Published - 2008
Event	2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction - Budapest, Hungary Duration: 7 May 2008 → 11 May 2008

Conference

Conference	2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction
Abbreviated title	ISSE 2008
Country/Territory	Hungary
City	Budapest
Period	7/05/08 → 11/05/08

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10.1109/ISSE.2008.5276670

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@inproceedings{d265ceafafce46bb9df7eedd40aaf2dc,

title = "Minimising the risk of defects in nano-imprint forming",

abstract = "Nano-Imprint Forming (NIF) is among the most attractive manufacturing technologies offering high yield and low-cost fabrication of three-dimensional fine structures and patterns with resolution of few nanometres [1]. Optimising NIF process is critical for achieving high quality products and minimising the risk of commonly observed defects. Using Finite Element Analysis, the effect of various process parameters is evaluated and design rules for safe and reliable NIF fabrication formulated. This work is part of a major UK Grand Challenge project - 3D-Mintegration - for design, simulation, fabrication, assembly and test of next generation 3D-miniaturised systems. {\textcopyright}2008 IEEE.",

author = "Stoyan Stoyanov and Farid Amalou and Keith Sinclair and Chris Bailey and Marc Desmulliez",

year = "2008",

doi = "10.1109/ISSE.2008.5276670",

language = "English",

isbn = "9781424439744",

pages = "367--372",

booktitle = "2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction, ISSE 2008",

note = "2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction, ISSE 2008 ; Conference date: 07-05-2008 Through 11-05-2008",

}

Stoyanov, S, Amalou, F, Sinclair, K, Bailey, C & Desmulliez, M 2008, Minimising the risk of defects in nano-imprint forming. in 2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction, ISSE 2008. pp. 367-372, 2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction, Budapest, Hungary, 7/05/08. https://doi.org/10.1109/ISSE.2008.5276670

TY - GEN

T1 - Minimising the risk of defects in nano-imprint forming

AU - Stoyanov, Stoyan

AU - Amalou, Farid

AU - Sinclair, Keith

AU - Bailey, Chris

AU - Desmulliez, Marc

PY - 2008

Y1 - 2008

N2 - Nano-Imprint Forming (NIF) is among the most attractive manufacturing technologies offering high yield and low-cost fabrication of three-dimensional fine structures and patterns with resolution of few nanometres [1]. Optimising NIF process is critical for achieving high quality products and minimising the risk of commonly observed defects. Using Finite Element Analysis, the effect of various process parameters is evaluated and design rules for safe and reliable NIF fabrication formulated. This work is part of a major UK Grand Challenge project - 3D-Mintegration - for design, simulation, fabrication, assembly and test of next generation 3D-miniaturised systems. ©2008 IEEE.

AB - Nano-Imprint Forming (NIF) is among the most attractive manufacturing technologies offering high yield and low-cost fabrication of three-dimensional fine structures and patterns with resolution of few nanometres [1]. Optimising NIF process is critical for achieving high quality products and minimising the risk of commonly observed defects. Using Finite Element Analysis, the effect of various process parameters is evaluated and design rules for safe and reliable NIF fabrication formulated. This work is part of a major UK Grand Challenge project - 3D-Mintegration - for design, simulation, fabrication, assembly and test of next generation 3D-miniaturised systems. ©2008 IEEE.

UR - http://www.scopus.com/inward/record.url?scp=71249146844&partnerID=8YFLogxK

U2 - 10.1109/ISSE.2008.5276670

DO - 10.1109/ISSE.2008.5276670

M3 - Conference contribution

SN - 9781424439744

SP - 367

EP - 372

BT - 2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction, ISSE 2008

T2 - 2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction

Y2 - 7 May 2008 through 11 May 2008

ER -

Minimising the risk of defects in nano-imprint forming

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