Minimising the risk of defects in nano-imprint forming

Stoyan Stoyanov, Farid Amalou, Keith Sinclair, Chris Bailey, Marc Desmulliez

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Nano-Imprint Forming (NIF) is among the most attractive manufacturing technologies offering high yield and low-cost fabrication of three-dimensional fine structures and patterns with resolution of few nanometres [1]. Optimising NIF process is critical for achieving high quality products and minimising the risk of commonly observed defects. Using Finite Element Analysis, the effect of various process parameters is evaluated and design rules for safe and reliable NIF fabrication formulated. This work is part of a major UK Grand Challenge project - 3D-Mintegration - for design, simulation, fabrication, assembly and test of next generation 3D-miniaturised systems. ©2008 IEEE.

Original languageEnglish
Title of host publication2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction, ISSE 2008
Pages367-372
Number of pages6
DOIs
Publication statusPublished - 2008
Event2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction - Budapest, Hungary
Duration: 7 May 200811 May 2008

Conference

Conference2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction
Abbreviated titleISSE 2008
CountryHungary
CityBudapest
Period7/05/0811/05/08

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  • Cite this

    Stoyanov, S., Amalou, F., Sinclair, K., Bailey, C., & Desmulliez, M. (2008). Minimising the risk of defects in nano-imprint forming. In 2008 31st International Spring Seminar on Electronics Technology: Reliability and Life-time Prediction, ISSE 2008 (pp. 367-372) https://doi.org/10.1109/ISSE.2008.5276670