Micro-optical fabrication based on laser smoothing of etched structures

Krystian Lukasz Wlodarczyk, E. Mendez, H. J. Baker, M. Taghizadeh, R. McBride, D. R. Hall

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Laser smoothing of reactive ion-etched (RIE) gratings and arbitrary multi-step structures in silica by a CO2 laser is shown to provide controlled relaxation of etched step features over scale lengths between 2μm and 30μm. Step heights of 1mm or less relax symmetrically, giving uniform edge softening. Asymmetry of the relaxation is seen for 3μm step height. However, the process enhances unwanted undercuts and grooves produced by etching errors. The process is promising for the production of low light scatter micro-optic components using low-cost binary or multi-level etched structures as a precursor.

Original languageEnglish
Title of host publicationOptics InfoBase Conference Papers
PublisherOSA Publishing
ISBN (Print)9781557528612
Publication statusPublished - 1 Jan 2008
EventOptical Fabrication and Testing, OFT 2008 - Rochester, NY, United Kingdom
Duration: 21 Oct 200824 Oct 2008


ConferenceOptical Fabrication and Testing, OFT 2008
Country/TerritoryUnited Kingdom
CityRochester, NY

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics


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