Micro-optical fabrication based on laser smoothing of etched structures

Krystian Lukasz Wlodarczyk; E. Mendez; H. J. Baker; M. Taghizadeh; R. McBride; D. R. Hall

doi:10.1364/OFT.2008.OWC2

Micro-optical fabrication based on laser smoothing of etched structures

Krystian Lukasz Wlodarczyk, E. Mendez, H. J. Baker, M. Taghizadeh, R. McBride, D. R. Hall

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Laser smoothing of reactive ion-etched (RIE) gratings and arbitrary multi-step structures in silica by a CO₂ laser is shown to provide controlled relaxation of etched step features over scale lengths between 2μm and 30μm. Step heights of 1mm or less relax symmetrically, giving uniform edge softening. Asymmetry of the relaxation is seen for 3μm step height. However, the process enhances unwanted undercuts and grooves produced by etching errors. The process is promising for the production of low light scatter micro-optic components using low-cost binary or multi-level etched structures as a precursor.

Original language	English
Title of host publication	Optics InfoBase Conference Papers
Publisher	OSA Publishing
ISBN (Print)	9781557528612
DOIs	https://doi.org/10.1364/OFT.2008.OWC2
Publication status	Published - 1 Jan 2008
Event	Optical Fabrication and Testing, OFT 2008 - Rochester, NY, United Kingdom Duration: 21 Oct 2008 → 24 Oct 2008

Conference

Conference	Optical Fabrication and Testing, OFT 2008
Country/Territory	United Kingdom
City	Rochester, NY
Period	21/10/08 → 24/10/08

ASJC Scopus subject areas

Instrumentation
Atomic and Molecular Physics, and Optics

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10.1364/OFT.2008.OWC2

http://www.opticsinfobase.org/abstract.cfm?uri=OFT-2008-OWC2

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@inproceedings{3a1c6702f5ea4b729494f91dfe3204dd,

title = "Micro-optical fabrication based on laser smoothing of etched structures",

abstract = "Laser smoothing of reactive ion-etched (RIE) gratings and arbitrary multi-step structures in silica by a CO2 laser is shown to provide controlled relaxation of etched step features over scale lengths between 2μm and 30μm. Step heights of 1mm or less relax symmetrically, giving uniform edge softening. Asymmetry of the relaxation is seen for 3μm step height. However, the process enhances unwanted undercuts and grooves produced by etching errors. The process is promising for the production of low light scatter micro-optic components using low-cost binary or multi-level etched structures as a precursor.",

author = "Wlodarczyk, {Krystian Lukasz} and E. Mendez and Baker, {H. J.} and M. Taghizadeh and R. McBride and Hall, {D. R.}",

year = "2008",

month = jan,

day = "1",

doi = "10.1364/OFT.2008.OWC2",

language = "English",

isbn = "9781557528612",

booktitle = "Optics InfoBase Conference Papers",

publisher = "OSA Publishing",

address = "United States",

note = "Optical Fabrication and Testing, OFT 2008 ; Conference date: 21-10-2008 Through 24-10-2008",

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TY - GEN

T1 - Micro-optical fabrication based on laser smoothing of etched structures

AU - Wlodarczyk, Krystian Lukasz

AU - Mendez, E.

AU - Baker, H. J.

AU - Taghizadeh, M.

AU - McBride, R.

AU - Hall, D. R.

PY - 2008/1/1

Y1 - 2008/1/1

N2 - Laser smoothing of reactive ion-etched (RIE) gratings and arbitrary multi-step structures in silica by a CO2 laser is shown to provide controlled relaxation of etched step features over scale lengths between 2μm and 30μm. Step heights of 1mm or less relax symmetrically, giving uniform edge softening. Asymmetry of the relaxation is seen for 3μm step height. However, the process enhances unwanted undercuts and grooves produced by etching errors. The process is promising for the production of low light scatter micro-optic components using low-cost binary or multi-level etched structures as a precursor.

AB - Laser smoothing of reactive ion-etched (RIE) gratings and arbitrary multi-step structures in silica by a CO2 laser is shown to provide controlled relaxation of etched step features over scale lengths between 2μm and 30μm. Step heights of 1mm or less relax symmetrically, giving uniform edge softening. Asymmetry of the relaxation is seen for 3μm step height. However, the process enhances unwanted undercuts and grooves produced by etching errors. The process is promising for the production of low light scatter micro-optic components using low-cost binary or multi-level etched structures as a precursor.

UR - http://www.scopus.com/inward/record.url?scp=84898635929&partnerID=8YFLogxK

U2 - 10.1364/OFT.2008.OWC2

DO - 10.1364/OFT.2008.OWC2

M3 - Conference contribution

SN - 9781557528612

BT - Optics InfoBase Conference Papers

PB - OSA Publishing

T2 - Optical Fabrication and Testing, OFT 2008

Y2 - 21 October 2008 through 24 October 2008

ER -

Micro-optical fabrication based on laser smoothing of etched structures

Abstract

Conference

ASJC Scopus subject areas

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