Methylpentacarbonylmanganese as organometallic precursor for the epitaxial growth of manganese selenide heterostructures

P Tomasini; A. Haidoux; J. C. Tédenac; M. Maurin

doi:10.1016/S0022-0248(98)00607-1

Methylpentacarbonylmanganese as organometallic precursor for the epitaxial growth of manganese selenide heterostructures

P Tomasini, A. Haidoux, J. C. Tédenac, M. Maurin

School of Engineering & Physical Sciences

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

Methylpentacarbonylmanganese and diethylselenium have been pyrolyzed for the organometallic chemical vapour deposition of manganese selenide thin films. Polycrystalline layers of manganese selenide exhibiting either rocksalt structure or both rocksalt and zincblende structure have been fabricated. The structure is related to substrate temperature. In addition, we report on the thermal stability of the methylpentacarbonylmanganese precursor. High cracking temperatures lead to the formation of manganese oxide instead of breaking the manganese-carbon bond. Moreover, we point out that the formation of carbonylselenide might be a parasitic reaction when cracking simultaneously methylpentacarbonylmanganese and diethylselenium. © 1998 Elsevier Science B.V. All rights reserved.

Original language	English
Pages (from-to)	572-576
Number of pages	5
Journal	Journal of Crystal Growth
Volume	193
Issue number	4
DOIs	https://doi.org/10.1016/S0022-0248(98)00607-1
Publication status	Published - 15 Oct 1998

Keywords

COSe
Methylpentacarbonylmanganese
MnO
MnSe
OMCVD

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10.1016/S0022-0248(98)00607-1

Cite this

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title = "Methylpentacarbonylmanganese as organometallic precursor for the epitaxial growth of manganese selenide heterostructures",

abstract = "Methylpentacarbonylmanganese and diethylselenium have been pyrolyzed for the organometallic chemical vapour deposition of manganese selenide thin films. Polycrystalline layers of manganese selenide exhibiting either rocksalt structure or both rocksalt and zincblende structure have been fabricated. The structure is related to substrate temperature. In addition, we report on the thermal stability of the methylpentacarbonylmanganese precursor. High cracking temperatures lead to the formation of manganese oxide instead of breaking the manganese-carbon bond. Moreover, we point out that the formation of carbonylselenide might be a parasitic reaction when cracking simultaneously methylpentacarbonylmanganese and diethylselenium. {\textcopyright} 1998 Elsevier Science B.V. All rights reserved.",

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author = "P Tomasini and A. Haidoux and T{\'e}denac, {J. C.} and M. Maurin",

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AU - Tomasini, P

AU - Haidoux, A.

AU - Tédenac, J. C.

AU - Maurin, M.

PY - 1998/10/15

Y1 - 1998/10/15

N2 - Methylpentacarbonylmanganese and diethylselenium have been pyrolyzed for the organometallic chemical vapour deposition of manganese selenide thin films. Polycrystalline layers of manganese selenide exhibiting either rocksalt structure or both rocksalt and zincblende structure have been fabricated. The structure is related to substrate temperature. In addition, we report on the thermal stability of the methylpentacarbonylmanganese precursor. High cracking temperatures lead to the formation of manganese oxide instead of breaking the manganese-carbon bond. Moreover, we point out that the formation of carbonylselenide might be a parasitic reaction when cracking simultaneously methylpentacarbonylmanganese and diethylselenium. © 1998 Elsevier Science B.V. All rights reserved.

AB - Methylpentacarbonylmanganese and diethylselenium have been pyrolyzed for the organometallic chemical vapour deposition of manganese selenide thin films. Polycrystalline layers of manganese selenide exhibiting either rocksalt structure or both rocksalt and zincblende structure have been fabricated. The structure is related to substrate temperature. In addition, we report on the thermal stability of the methylpentacarbonylmanganese precursor. High cracking temperatures lead to the formation of manganese oxide instead of breaking the manganese-carbon bond. Moreover, we point out that the formation of carbonylselenide might be a parasitic reaction when cracking simultaneously methylpentacarbonylmanganese and diethylselenium. © 1998 Elsevier Science B.V. All rights reserved.

KW - COSe

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KW - MnO

KW - MnSe

KW - OMCVD

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DO - 10.1016/S0022-0248(98)00607-1

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JF - Journal of Crystal Growth

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Methylpentacarbonylmanganese as organometallic precursor for the epitaxial growth of manganese selenide heterostructures

Abstract

Keywords

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