Mechanisms of strain induced roughening and dislocation multiplication in Si[x]Ge[1-x] thin films

David Jesson, K M Chen, S J Pennycook, T Thundat, R J Warmack

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)1040-1048
Number of pages9
JournalJournal of Electronic Materials
Volume26
Publication statusPublished - 1997

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Jesson, D., Chen, K. M., Pennycook, S. J., Thundat, T., & Warmack, R. J. (1997). Mechanisms of strain induced roughening and dislocation multiplication in Si[x]Ge[1-x] thin films. Journal of Electronic Materials, 26, 1040-1048.