Mechanisms of strain induced roughening and dislocation multiplication in Si[x]Ge[1-x] thin films

David Jesson, K M Chen, S J Pennycook, T Thundat, R J Warmack

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)1040-1048
Number of pages9
JournalJournal of Electronic Materials
Volume26
Publication statusPublished - 1997

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