Low temperature plasma chemical vapour deposition of carbon nanotubes

J. I B Wilson, N. Scheerbaum, S. Karim, N. Polwart, P. John, Y. Fan, A. G. Fitzgerald

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Carbon nanotubes have been grown on alumina-supported iron compound catalysts by 2.45 GHz microwave plasma chemical vapour deposition, without additional substrate heating, using methane/argon gas mixtures with no added hydrogen, and with microwave powers typically up to 100 W. The conditions that produced a stable plasma were investigated by statistical selection of the values of power, pressure and gas flow rates. The conditions for abundant multi-walled nanotube formation were determined within this parameter space by SEM and TEM observations of the deposited material. The temperatures of the plasma and of the substrate in the reactor were investigated by optical emission spectroscopy and melting point samples, respectively. © 2002 Elsevier Science B.V. All rights reserved.

Original languageEnglish
Pages (from-to)918-921
Number of pages4
JournalDiamond and Related Materials
Volume11
Issue number3-6
DOIs
Publication statusPublished - Mar 2002

Keywords

  • Carbon
  • Chemical vapour deposition
  • Plasma
  • Spectroscopy

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    Wilson, J. I. B., Scheerbaum, N., Karim, S., Polwart, N., John, P., Fan, Y., & Fitzgerald, A. G. (2002). Low temperature plasma chemical vapour deposition of carbon nanotubes. Diamond and Related Materials, 11(3-6), 918-921. https://doi.org/10.1016/S0925-9635(01)00725-7