Low temperature plasma chemical vapour deposition of carbon nanotubes

J. I B Wilson; N. Scheerbaum; S. Karim; N. Polwart; P. John; Y. Fan; A. G. Fitzgerald

doi:10.1016/S0925-9635(01)00725-7

Low temperature plasma chemical vapour deposition of carbon nanotubes

J. I B Wilson, N. Scheerbaum, S. Karim, N. Polwart, P. John, Y. Fan, A. G. Fitzgerald

School of Engineering & Physical Sciences

Research output: Contribution to journal › Article › peer-review

17 Citations (Scopus)

Abstract

Carbon nanotubes have been grown on alumina-supported iron compound catalysts by 2.45 GHz microwave plasma chemical vapour deposition, without additional substrate heating, using methane/argon gas mixtures with no added hydrogen, and with microwave powers typically up to 100 W. The conditions that produced a stable plasma were investigated by statistical selection of the values of power, pressure and gas flow rates. The conditions for abundant multi-walled nanotube formation were determined within this parameter space by SEM and TEM observations of the deposited material. The temperatures of the plasma and of the substrate in the reactor were investigated by optical emission spectroscopy and melting point samples, respectively. © 2002 Elsevier Science B.V. All rights reserved.

Original language	English
Pages (from-to)	918-921
Number of pages	4
Journal	Diamond and Related Materials
Volume	11
Issue number	3-6
DOIs	https://doi.org/10.1016/S0925-9635(01)00725-7
Publication status	Published - Mar 2002

Keywords

Carbon
Chemical vapour deposition
Plasma
Spectroscopy

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10.1016/S0925-9635(01)00725-7

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T1 - Low temperature plasma chemical vapour deposition of carbon nanotubes

AU - Wilson, J. I B

AU - Scheerbaum, N.

AU - Karim, S.

AU - Polwart, N.

AU - John, P.

AU - Fan, Y.

AU - Fitzgerald, A. G.

PY - 2002/3

Y1 - 2002/3

N2 - Carbon nanotubes have been grown on alumina-supported iron compound catalysts by 2.45 GHz microwave plasma chemical vapour deposition, without additional substrate heating, using methane/argon gas mixtures with no added hydrogen, and with microwave powers typically up to 100 W. The conditions that produced a stable plasma were investigated by statistical selection of the values of power, pressure and gas flow rates. The conditions for abundant multi-walled nanotube formation were determined within this parameter space by SEM and TEM observations of the deposited material. The temperatures of the plasma and of the substrate in the reactor were investigated by optical emission spectroscopy and melting point samples, respectively. © 2002 Elsevier Science B.V. All rights reserved.

AB - Carbon nanotubes have been grown on alumina-supported iron compound catalysts by 2.45 GHz microwave plasma chemical vapour deposition, without additional substrate heating, using methane/argon gas mixtures with no added hydrogen, and with microwave powers typically up to 100 W. The conditions that produced a stable plasma were investigated by statistical selection of the values of power, pressure and gas flow rates. The conditions for abundant multi-walled nanotube formation were determined within this parameter space by SEM and TEM observations of the deposited material. The temperatures of the plasma and of the substrate in the reactor were investigated by optical emission spectroscopy and melting point samples, respectively. © 2002 Elsevier Science B.V. All rights reserved.

KW - Carbon

KW - Chemical vapour deposition

KW - Plasma

KW - Spectroscopy

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DO - 10.1016/S0925-9635(01)00725-7

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JO - Diamond and Related Materials

JF - Diamond and Related Materials

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ER -

Low temperature plasma chemical vapour deposition of carbon nanotubes

Abstract

Keywords

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