Abstract
In this paper, we report on the fabrication and experimental verification of waveguide structures for electromagnetic pulse (EMP) sensing. The waveguides were realized in z-cut lithium niobate (LiNbO3) using the e-beam and photolithographic technique followed by reactive-ion-etching processes. Channel structures with the width of 1 mu m were etched and, after backfilling of the etched channels with amorphous silicon (a-Si), resulted in a single-mode waveguide structure for operation at 1550 nm. The fabricated devices have successfully measured both the peak field strength and the temporal pulse shape of a range of EMPs.
| Original language | English |
|---|---|
| Pages (from-to) | 5603-5609 |
| Number of pages | 7 |
| Journal | IEEE Sensors Journal |
| Volume | 16 |
| Issue number | 14 |
| Early online date | 17 May 2016 |
| DOIs | |
| Publication status | Published - 15 Jul 2016 |
Keywords
- Coupled mode analysis
- electromagnetic fields
- etching
- lithium compounds
- lithography
- optical coupling
- optical device fabrication
- optical waveguides
- OPTICAL-WAVEGUIDES