Laser processing of silicon

Ian W. Boyd, J. I B Wilson

Research output: Contribution to journalLiterature review

Abstract

The application of laser radiation to the processing of silicon and silicon-based solid state devices has developed in the past two decades. A few of these techniques are becoming established practice in the semiconductor industry, whilst others remain the subject of research and heated debate. Techniques include the solid phase and the liquid phase regrowth of amorphous silicon layers, together with the more novel application of laser photochemistry. © 1983 Nature Publishing Group.

Original languageEnglish
Pages (from-to)481-486
Number of pages6
JournalNature
Volume303
Issue number5917
DOIs
Publication statusPublished - 1983

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    Boyd, I. W., & Wilson, J. I. B. (1983). Laser processing of silicon. Nature, 303(5917), 481-486. https://doi.org/10.1038/303481a0