LASER DEPOSITION OF LOCALISED SILICON NITRIDE FILMS.

T. D. Binnie; M. J. Colles; J. I B Wilson; R. S. Dhariwal

LASER DEPOSITION OF LOCALISED SILICON NITRIDE FILMS.

T. D. Binnie
, M. J. Colles
, J. I B Wilson
, R. S. Dhariwal

School of Engineering & Physical Sciences

Research output: Contribution to conference › Paper

Abstract

By using a well-focussed argon ion laser beam and by monitoring the reflected intensities of specular and scattered radiation, for the first time micron-scale lines of silicon nitride have been deposited on silicon substrates immersed in silane/argon/buffer gas mixtures.

Original language	English
Publication status	Published - 1986

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@conference{5b8899b5e11443b48c6c604468200fd2,

title = "LASER DEPOSITION OF LOCALISED SILICON NITRIDE FILMS.",

abstract = "By using a well-focussed argon ion laser beam and by monitoring the reflected intensities of specular and scattered radiation, for the first time micron-scale lines of silicon nitride have been deposited on silicon substrates immersed in silane/argon/buffer gas mixtures.",

author = "Binnie, \{T. D.\} and Colles, \{M. J.\} and Wilson, \{J. I B\} and Dhariwal, \{R. S.\}",

year = "1986",

language = "English",

}

TY - CONF

T1 - LASER DEPOSITION OF LOCALISED SILICON NITRIDE FILMS.

AU - Binnie, T. D.

AU - Colles, M. J.

AU - Wilson, J. I B

AU - Dhariwal, R. S.

PY - 1986

Y1 - 1986

N2 - By using a well-focussed argon ion laser beam and by monitoring the reflected intensities of specular and scattered radiation, for the first time micron-scale lines of silicon nitride have been deposited on silicon substrates immersed in silane/argon/buffer gas mixtures.

AB - By using a well-focussed argon ion laser beam and by monitoring the reflected intensities of specular and scattered radiation, for the first time micron-scale lines of silicon nitride have been deposited on silicon substrates immersed in silane/argon/buffer gas mixtures.

UR - https://www.scopus.com/pages/publications/0022865334

M3 - Paper

ER -

LASER DEPOSITION OF LOCALISED SILICON NITRIDE FILMS.

Abstract

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