LASER DEPOSITION OF LOCALISED SILICON NITRIDE FILMS.

T. D. Binnie, M. J. Colles, J. I B Wilson, R. S. Dhariwal

Research output: Contribution to conferencePaper

Abstract

By using a well-focussed argon ion laser beam and by monitoring the reflected intensities of specular and scattered radiation, for the first time micron-scale lines of silicon nitride have been deposited on silicon substrates immersed in silane/argon/buffer gas mixtures.

Original languageEnglish
Publication statusPublished - 1986

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    Binnie, T. D., Colles, M. J., Wilson, J. I. B., & Dhariwal, R. S. (1986). LASER DEPOSITION OF LOCALISED SILICON NITRIDE FILMS..